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m-tert-Butoxystyrene

m-tert-Butoxystyrene

CAS Number: 105612-79-1

Molecular Formula: C12H16O

About m-tert-Butoxystyrene

m-tert-Butoxystyrene (CAS 95418-58-9) serves as a vital acid-labile monomer in the synthesis of advanced photoresists for semiconductor lithography, where its high purity fine chemicals profile ensures precise line-edge roughness control during deep ultraviolet (DUV) processing. The 1-(tert-butoxy)-3-vinylbenzene deriv...

m-tert-Butoxystyrene Specifications

CAS Number
105612-79-1
Molecular Formula
C12H16O
Molecular Weight
176.25 g/mol
IUPAC Name
1-ethenyl-3-[(2-methylpropan-2-yl)oxy]benzene
Canonical SMILES
CC(C)(C)OC1=CC=CC(C=C)=C1
Molecular Weight
176.25 g/mol
Physical appearance
Colorless to almost colorless clear liquid

Photoresist Monomer

A critical functional monomer used in the synthesis of chemically amplified photoresists for semiconductor lithography and microelectronics fabrication

Polymer Building Block

A versatile styrene derivative used to produce specialty polymers and copolymers with acid-labile protecting groups for advanced coatings and materials science

Biomedical Polymer Precursor

An essential monomer utilized in the development of biocompatible materials, surfaces, and drug delivery systems

Organic Synthesis Intermediate

A functionalized building block employed in the synthesis of complex organic molecules and pharmaceutical intermediates.

m-tert-Butoxystyrene FAQs

Minimum Order Quantity

25 kg (evaluation) · 1 MT (commercial)

Lead Time

3 – 5 weeks estimated

Delivery Terms

FOB*

Packaging

20 L pails, 200 L HDPE drums, 1000 L IBC

US Availability

US Facility Inventory

Documentation

US SDS · COA · TDS · Specification sheet

US Regulatory & Quality Information

TSCA status*

US SDS / HazCom*

GHS classification*

ISO 9001:2015 site*

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California Prop 65*

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