

CAS Number: 7697-37-2
Molecular Formula: HNO3
Nitric Acid (CAS No: 7697-37-2) is a highly corrosive mineral acid and powerful oxidiser that serves as a cornerstone reagent within the advanced materials and electronics manufacturing sectors. In high-purity electronic grades, it is critical for semiconductor wafer cleaning, anisotropic etching of printed circuit boa...

Category : Industrial Polymers, Semiconductors & Electronic Chemicals
Sub-Category : Reactive Epoxy Binders & Diluents, Substrates, CMP Slurries & Polymers
Description : Epoxy Resin portfolio encompasses a multirange of molecular weights and modifications, from low-visc...
Category : Solar & Photovoltaic Chemicals
Sub-Category : Wet Processing Acids & Bases
Description : Potassium hydroxide (CAS No: 1310-58-3) serves as a critical inorganic alkaline building block acros...
Category : Battery & Energy Storage Materials
Sub-Category : Cathode Active Materials & Precursors
Description : Sulfuric acid, cobalt salt (CAS No: 10124-43-3) is experiencing a structural surge in demand within ...