Tantalum n-butoxide

CAS Number: 51094-78-1

Molecular Formula: C20H45O5Ta

Purity: 99.99% purity

About Tantalum n-butoxide

Tantalum(V) n-butoxide (CAS 51094-78-1) is a critical liquid precursor for the deposition of high-purity tantalum oxide thin films in semiconductor fabrication, where domestic custom synthesis services are increasingly focused on achieving 99.99% trace metals basis purity to meet stringent dielectric performance requir...

Tantalum n-butoxide Specifications

CAS Number

51094-78-1

Molecular Formula

C20H45O5Ta

Molecular Weight

546.52 g/mol

IUPAC Name

pentakis(butan-1-olate);tantalum(5+)

Canonical SMILES

CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-].[Ta+5]

InChI Key

QORWLRPWMJEJKP-UHFFFAOYSA-N

CAS Number

51094-78-1

Molecular Formula

C20H45O5Ta

Molecular Weight

546.52 g/mol

IUPAC Name

pentakis(butan-1-olate);tantalum(5+)

Canonical SMILES

CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-].[Ta+5]

InChI Key

QORWLRPWMJEJKP-UHFFFAOYSA-N

Molecular Weight

546.52 g/mol

Purity

99.99% purity

Physical appearance

Colorless to light yellow liquid

Dielectric Precursor

A starting material utilized for the synthesis of tantalum oxides used as high-k dielectrics in capacitors, dynamic random access memory devices (DRAMs), and gate insulators in VLSI microcircuits

Thin Film Deposition Source

A metal-organic precursor employed in sol-gel and metal-organic chemical vapor deposition (MOCVD) processes to fabricate conformal tantalum oxide based materials for optical coatings and microelectronic applications

Chemical Intermediate

A versatile reagent and catalyst used in the synthesis of tantalum oxide nanoparticles, NaTaO3 thin films, and tantalum-doped TiO2

Pharmaceutical Intermediate

An organometallic building block utilized in the pharmaceutical industry for the development of medicinal compounds and specialized research applications.