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Sputtering Targets

Sputtering Targets

CAS Number: 7429-90-5

About Sputtering Targets

Sputtering targets represent a foundational technology in the American thin-film deposition market, where US-based semiconductor manufacturers and material science laboratories rely on high-purity materials to advance microelectronics and optical coatings. These essential PVD materials are central to the domestic high-...

Sputtering Targets Specifications

CAS Number
7429-90-5
IUPAC Name
aluminum; manganese
HSN No
85439000
Precautionary Statement Codes
P210, P223, P231+P232, P240, P241, and P280
Hazard Classes and Categories
Flam. Sol. 1 (100%) Water-react. 2 (100%)

Semiconductor Material

A high-purity source material used in physical vapor deposition (PVD) to deposit conductive interconnects, barrier layers, and gate electrodes on silicon wafers

Optical Coating Source

A precision material utilized to create anti-reflective, reflective, and filtering thin films for lenses, mirrors, and display technologies

Photovoltaic Material

A critical component in the production of thin-film solar cells for depositing transparent conductive oxides and absorber layers

Data Storage Material

A specialized material used to deposit magnetic layers and protective overcoats on hard disk drives and magnetic media

Wear-Resistant Coating

A functional material employed to apply hard, corrosion-resistant, or biocompatible thin films onto industrial tools and medical implants.

Sputtering Targets FAQs

Minimum Order Quantity

25 kg (evaluation) · 1 MT (commercial)

Lead Time

3 – 5 weeks estimated

Delivery Terms

FOB*

Packaging

20 L pails, 200 L HDPE drums, 1000 L IBC

US Availability

US Facility Inventory

Documentation

US SDS · COA · TDS · Specification sheet

US Regulatory & Quality Information

TSCA status*

US SDS / HazCom*

GHS classification*

ISO 9001:2015 site*

DOT shipping classification*

FDA status*

EPA status*

California Prop 65*

Reliable US supply chain

Regulatory compliance

On-time delivery

Technical expert support

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